Thin film growth equipment

• Magnetron sputtering reactor
• Capacitively coupled RF plasma reactor
• ECR-MW plasma reactor
• MW surfatron excited plasma reactor
• Electron beam evaporation PVD reactor

Surface functionalization

• Atmospheric plasma DBD reactor (corona treatment)
• Atmospheric pressure plasma torch
• Low pressure MW and RF plasma activation
• Low pressure activation by atomic source

Surface and thin film characterization

• UV-Vis reflection, transmission, and absorption spectroscopy
• Fluorescence analysis
• Atomic force microscopy
• X-ray photoelectron spectroscopy
• Thermal desorption analysis aparatus (with capability for TDP and Auger analysis)
• Contact angle measurements (static, dynamic). Surface energy evaluation
• Profilometry
• Thin films conductivity

Plasma diagnosis

• Langmuir probe
• Optical emission spectroscopy
• Mass spectroscopy